High index contrast polysiloxane waveguides fabricated by dry etching
نویسندگان
چکیده
The authors demonstrate the production of low loss enhanced index contrast waveguides by reactive ion etching of IPGTM polysiloxane thin films. The use of a silica mask and CHF3 /O2 etch gas led to large etch selectivity between the silica and IPGTM of !20 and etch rates of !100 nm /min. This work indicates that compact optical circuits could be successfully fabricated for telecommunication applications using polysiloxane films. © 2009 American Vacuum Society. #DOI: 10.1116/1.3119670$
منابع مشابه
Fabrication and characterization of low loss rib chalcogenide waveguides made by dry etching.
We report the fabrication and characterization of rib chalcogenide waveguides produced by dry etching with CF4 and O2. The high index contrast waveguides (Deltan ~1) show a minimum propagation loss of 0.25 dB/cm. The high refractive nonlinearity of 100 times silica in As2S3 allowed observation of a pi phase shift due to self-phase modulation of an 8 ps duration 1573 nm pulse in a 5 cm long wave...
متن کاملLow loss high index contrast nanoimprinted polysiloxane waveguides.
Nanoimprint lithography is gaining rapid acceptance in fields as diverse as microelectronics and microfluidics due to its simplicity high resolution and low cost. These properties are critically important for the fabrication of photonic devices, where cost is often the major inhibiting deployment factor for high volume applications. We report here on the use of nanoimprint technology to fabrica...
متن کاملHigh-efficiency native-oxide-passivated high-index-contrast ridge waveguide lasers
A GaAs-based high-index-contrast ridge waveguide laser is fabricated using a self-aligned process of deep dry etching plus oxygen-enhanced wet thermal oxidation of low Al-content AlGaAs. Lasers operating at l1⁄4 813 nm (CW, 300 K) with external differential quantum efficiencies as high as 78% are demonstrated, indicating effective passivation of the directly-oxidised etched active region sidewa...
متن کاملRefractive Index Sensor Based on a 1D Photonic Crystal in a Microfluidic Channel
A refractive index sensor has been fabricated in silicon oxynitride by standard UV lithography and dry etching processes. The refractive index sensor consists of a 1D photonic crystal (PhC) embedded in a microfluidic channel addressed by fiber-terminated planar waveguides. Experimental demonstrations performed with several ethanol solutions ranging from a purity of 96.00% (n = 1.36356) to 95.04...
متن کاملLow-Loss Slot Waveguides with Silicon (111) Surfaces Realized Using Anisotropic Wet Etching
We demonstrate low-loss slot waveguides on silicon-on-insulator platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process. A tetramethylammonium hydroxide-based anisotropic wet etching technique was then used to remove any residual side wall roughness. Using this fabrication technique, propagatio...
متن کامل